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Powerful Solutions for Critical Cleaning
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ProSys Megasonic cleaning systems and technology can enable you to:
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• Quickly, safely, and effectively clean contamination-sensitive products
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• Improve your removal efficiency to above 99%
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• Reduce process time
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Using high-frequency acoustic energy, our advanced megasonics technology enables you to more tightly control your process and to make it faster and more efficient.
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Problems we solve include:
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• FEOL and BEOL cleans
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• Post-CMP/polish cleaning
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• Thick resist develop such as SU-8™
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• TSV process enhancement and residual glue removal
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• LIGA/MEMS process enhancements
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• Solar process enhancement
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Working with ProSys offers:
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• A wide range of solutions for both single wafer and batch cleaning.
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• Custom Megasonic cleaning system designs to solve a variety of difficult contamination-sensitive cleaning issues.
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• Proprietary Direct Technology that improves reliability, uptime and yields.
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• Repair and replacement services for your existing Megasonic systems. (details)
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• A high level of support – including help with process optimization.
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• Access to the latest developments in cleaning and continual advancements in megasonic technology.
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<empty>NEWS<empty>
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ProSys Receives Approval for Its Radial Uniformity Patent in Europe
read more
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SPS-Europe Named Semiconductor Distributor for Europe
read more
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ProSys Receives a Second Patent for its Metrology Tool for Characterizing Cleaning Chemistries
read more
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<empty>EVENTS<empty>
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UCPSS 2012, Ghent, Belgium, Sept. 16-19, 2012
details
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©1997-2011 ProSys Inc.		      
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