ProSys - Dual Zone MegPie

Dual Zone MegPie

The Dual Zone MegPie is a single wafer Megasonic transducer for cleaning and sonochemical processing of multiple substrate sizes in one chamber. It applies a uniform dose of acoustic energy to a rotating substrate. The MegPie will improve the process efficiency and lower the process time. The MegPie is easy to retrofit to your single substrate processing tool.

•	Processes two sizes of substrates: 150/200mm, 200/300mm, or 300/450

•	The sapphire resonator is particle neutral and will not add particles to the process

•	Patented crystal bond to the resonator

•	Patented RF connection to the crystal

•	Redundant internal RTP temperature monitoring

•	Custom sizes available

•	Sapphire resonator is compatible with all processing chemistries

•	Uniform direct acoustic energy applied to the process

•	Increased process efficiency

•	Reduced process time

•	Reduced process chemistry usage

•	No moving parts, no consumables

•	Replaces brushes and nozzles

•	Power density: 0.05 – 2.0 Watts/cm2

•	Operating frequencies available: 400 kHz – 3 MhZ

•	Mounting height: 0.02”– 0.14” (0.5mm – 3.5mm)

•	Process fluid temperature: 15°C – 60°C

•	Process fluid required depends on the substrate size and RPM: 0.5 – 3.0 lpm

•	Operating RPM: 1 – 100

•	Nitrogen or CDA purge: 10 lpm

•	Mounting with 3 x M6 female threaded bosses

•	Use with IMPulse RF electronics

•	Post-CMP	•	LIGA process

•	TSV	•	Mask cleaning

•	Pre SOIC bond clean	•	Etch assist

•	SU-8 develop	•	Plating pre-cleaning

•	Lift off	•	Pre-plating bubble removal

•	Resist strip	•	Post-laser cleaning

Quick Response

Technical Information

Specifications

Processes Supported

Product Note
with specs and drawings (PDF)